Monday, August 21, 2006
Nanoscale patterning with block copolymers
Recent Materials Today cover story: The self assembly of block copolymers offers new strategies to create patterns on the nanoscale. The polymeric constituents, substrate surface properties, and experimental conditions allow the control and optimization of patterns for specific applications. The method offers interesting possibilities in combination with high-resolution lithography methods, and could become of particular in microtechnology and biosensing ... Click here to read the full story.
